Experimental Verification of the Physical Model for Droplet-Particles Cleaning in Pulsed Bias Arc Ion Plating

注意:本論文已在J. Mater. Sci. Technol. 2005,21(3):423-426發表

Yanhui ZHAO 趙彥輝1)+ , Guoqiang LIN1), Lishi WEN1, 2) and Chuang DONG1)
1)State Key Laboratory for Materials Modification by Laser, Ion and Electron beams, Dalian University of Technology, Dalian 116024, China
2)Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

Abstract:It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
KEY WORDS: Arc ion plating, Pulsed bias, TiN film, Droplet-particles


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